四(二甲氨基)锡 , (99.99%-Sn)
Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM
分子式: Sn[N(CH?)?]
分子量: 295.01
纯度: (99.99%-Sn)
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Technical Notes:
1. ALD/CVD precursor for thin oxide based film deposition, that is widely used in the new generation dye
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