细分目录
全部
硅
电极材料用试剂
单质
ICP单标
ICP/MS单标
ICP混标
原子吸收标准品及对照品
D4927
D5184
14597
氧化物,氮化物以及其他陶瓷纳米颗粒
其他硅烷
生物相容金属
HJ 974-2018
品牌
全部
J&K
AccuStandard
Fluorochem
Strem
Apollo
Thermo Scientific
Tmstandard-有机单标
XFNANO
Aldrich
纯度
全部
(99.5%)
(99.999%)
(99.9999%)
(99+%)
100 μg/mL in Water, tr Hydrofluoric acid
100%
1000 μg/g in 75 cSt Base oil
1000 μg/mL in Water, tr Sodium hydroxide, tr Hydrofluoric acid
1000 μg/mL in Water, tr Hydrofluoric acid
10000 μg/mL in Water, tr Hydrofluoric acid
5000 μg/g in 75 cSt Base oil
95%%+
98.4%
98%
99.5%
99.9%
99.99%
99.9985%
99.999%
99.999+%
99.9999%
99%
99+%
min. 97%
nanopowder, <100?nm particle size (TEM), ≥98% trace metals basis
pieces, 99.95% trace metals basis
powder, ?325?mesh, 99% trace metals basis
powder, ?60?mesh, 99.999% trace metals basis
sphere, 10pcs, diameter 2.0mm, precision sphere grade 25
sphere, 20pcs, diameter 2.0mm, precision sphere grade 25
sphere, 50pcs, diameter 2.0mm, precision sphere grade 25
sputtering target, diam. × thickness 2.00?in. × 0.25?in., 99.999% trace metals b
wafer (single side polished), <100>, N-type, contains No dopant, diam. × thickne
wafer (single side polished), <100>, N-type, contains phosphorus as dopant, diam
wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × t
wafer (single side polished), <111>, N-type, contains No dopant, diam. × thickne
wafer (single side polished), <111>, P-type, contains boron as dopant, diam. × t
wafer (single side polished), contains phosphorus as dopant, <111>, N-type, diam
wafer, <111>, P-type, contains boron as dopant, diam. × thickness 2?in. × 0.5?mm
规格
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100g
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100mm
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10ml
10mm
150mm
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1each
1g
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200mg
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250mg
25g
25mg
25ml
25mm
2ea
2g
2kg
500g
500mg
500ml
50g
50mg
50ml
50mm
5ea
5g
5kg
5ml
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