四双(乙基甲基氨)铪(IV , (99.99+%-Hf, <0.15% Zr)
Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr) TEMAH PURATREM
分子式: Hf[N(CH?)(CH?CH?)]
分子量: 410.90
纯度: (99.99+%-Hf, <0.15% Zr)
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Technical Notes:
1. ALD/CVD precursor for Hf thin film deposition.
References:
1.Chem. Mater. 2002, 14, 4350.
2.Chem. Vap. Deposition 2002. 8 1 99.
3.J. Electrochem. Soc. 2005, 152, G213.
4.Chem. Mater.2004, 16, 3497 .
