铜（II）双（二甲基氨基-2-丙氧基） , min. 97%
Bis(dimethylamino-2-propoxy)copper(II), min. 97% Cu(dmap)
分子式: Cu(C?H??NO)
分子量: 267.86
纯度: min. 97%
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Technical Note:
1.AL D/CVD precursor for the preparation of Cu, Cu2O, or Cu2S films for electronic applications at temperatures ranging from 135 to 170'C. The Tsubl = 90'C/0.05 Torr and has a decomposition te mperature of 1 85-188C.
References:
1.Chem. Mater., 2011, 23, 441 1
2.Chem. Mater., 2014, 26, 3731
3.J. Phys. Chem. c 2015, 119, 9375
4.Dalton Trans., 2015, 44, 10188
5.Chem. Mater. 2016, 28, 6282
6.Dalton Trans., 2017, 46, 5790
7.Chem. Mater. 2017, 29, 6502
