二甲基异丙氧基铝 , (99.99+%-Al)
Dimethylaluminum i-propoxide, 98% (99.99+%-Al) PURATREM
分子式: (CH?)?Al(OC?H?)
分子量: 116.14
纯度: (99.99+%-Al)
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基本信息
安全信息
化学和物理性质
产品描述
Technical Notes：
Used as MOCVD precursor for making of CoAl2O4 films [1], AL D precursor for making of Al2Os films 2-6, 8-10, and as a Al doping source for ZnO films [7]
References:
1.Electrochimica Acta, 2005, 50, 4592
2.J. Kor. Phys. Soc., 2006, 48, 131
3.Thin Solid Films, 2010, 518, 3658
4.J. Vac. Sci. Technol. A, 2012, 3o, 021505
5.Chem. Mater. 2013, 25, 4619
6.J. Vac. Sci. Technol. A, 2014, 32, 021514
7.J. Mater. Chem. c, 2015,3, 3095
8.Thin Solid Films, 201 7, 641, 47
