双(甲基环戊二烯基)(甲基)(甲氧基)锆(IV),98 +％ , 98+%
Bis(methylcyclopentadienyl)(methyl)(methoxy)zirconium(IV), 98+%
分子式: C??H??OZr
分子量: 295.53
纯度: 98+%
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基本信息
安全信息
化学和物理性质
产品描述
Technical Notes:
1. Precursor for the atomic layer deposition of zirconium oxide using water or ozone as co -reactants.1-6
References:
1.J. Electrochem. Soc. 2010, 157 (10), G202-G210.
2.Thin Solid Films, 2010, 519 (2), 666-673.
3. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing,
Measurement, and Phenomena, 2009, 27, 389.
4.Chem. Mater., 2008, 20 (17), 5698-5705
5.Chemical vapor deposition, 2008, 14, 358-365
6. Journal of Materials Chemistry, 2008, 28, 3385-3390.
