diblock copolymers Polyhedral pligomeric silsesquioxane (POSS) based copolymers Poly(dimethylsiloxane-b-POSSEtMA) POSSEtMA: (2-Propenoic acid, 2-methyl-3-(heptacyclo 9.5.1.1(3,9) 1(5,15) 1(7,13)octasi|diblock copolymers Polyhedral pligomeric silsesquioxane (POSS) based copolymers Poly(dimethylsiloxane-b-POSSEtMA) POSSEtMA: (2-Propenoic acid, 2-methyl-3-(heptacyclo 9.5.1.1(3,9) 1(5,15) 1(7,13)octasi-百灵威

diblock copolymers Polyhedral pligomeric silsesquioxane (POSS) based copolymers Poly(dimethylsiloxane-b-POSSEtMA) POSSEtMA: (2-Propenoic acid, 2-methyl-3-(heptacyclo 9.5.1.1(3,9) 1(5,15) 1(7,13)octasi

品牌: Polymer Source

产品编号: P14029-DMSPOSSEtMA

CAS: 0

分子式: null

分子量: null

纯度: null

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