有机化学
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锆催化剂
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Amethyst
J&K
Fluorochem
Strem
Accela
Apollo
TCI
Aldrich
纯度
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-
(99.5%-Zr)
(99.9%-Zr)
(99.99%-Zr)
(99.99+%-Zr)
(99+%-Zr)
≥40% ZrO2 basis
≥98%
≥99.99%
≥99.99% trace metals basis
325?mesh
35?wt. % in H2O, 99.9% trace metals basis (purity excludes Hf)
60% (n-propanol)
70?wt. % in 1-propanol
80?wt. % in 1-butanol
95%
97.0%(T)
97%
98%
98% (99.99%-Zr)
99.9%
99.9% trace metals basis
99.99% trace metals basis
99.99% trace metals basis (purity excludes ~2% HfO2)
99%
99+%
anhydrous, powder, 99.9% trace metals basis
electronic grade, ≥99.99% trace metals basis
in H2O, contains 1-2% tartaric acid as stabilizer
low form, capacity 55?mL
min. 95%
min. 97%
min. 98%
N/A
nanoparticles, dispersion, <100?nm particle size (BET), 10?wt. % in H2O
nanoparticles, dispersion, <100?nm particle size (BET), 5?wt. % in H2O
nanopowder
nanopowder, <100?nm particle size (BET)
nanopowder, <100?nm particle size (TEM)
nanopowder, <50?nm particle size (BET), 99.0% trace metals basis
packaged for use in deposition systems
pore 18?? (mesoporous), 99% trace metals basis
powder, 5?μm, 99% trace metals basis
powder, pore size 1-2?μm, ≥99% trace metals basis
Straight wall, capacity 55?mL
technical grade
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125g
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2.5kg
250g
250mg
250ml
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2kg
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500g
500mg
500ml
50g
50ml
5g
5kg
5ml
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