在半导体、光伏、显示面板等高科技产业中，化学气相沉积（CVD）和原子层沉积（ALD）技术已成为薄膜制备的核心工艺。而前驱体源作为CVD/ALD工艺的关键材料，其质量直接决定了薄膜的性能和器件的可靠性。如何选择高质量、高性价比的前驱体源，成为企业提升工艺水平和降低生产成本的重要课题。

为什么选择我们的CVD/ALD前驱体源？

1. 超高纯度，确保工艺稳定性

    我们的大多数前驱体纯度高达99.99%以上，有效减少杂质对薄膜性能的影响。
    高纯度前驱体源可显著提升薄膜的均匀性和致密性，满足高端器件对材料性能的苛刻要求。

2. 价格优势，降低生产成本

    通过优化生产工艺和规模化供应，我们提供极具竞争力的价格，帮助客户大幅降低CVD/ALD工艺的材料成本。
    在保证高质量的前提下，我们的价格优势让您在成本控制上更具灵活性。

3. 提供清洗钢瓶选项，保障使用安全

    我们提供专业的钢瓶清洗服务选项，确保前驱体源储存和运输过程中的纯净度，避免交叉污染。
    清洗后的钢瓶经过严格检测，符合国际安全标准，为客户提供更安全、更可靠的使用体验。

应用领域

1. 半导体制造

    高k介质、金属栅极、阻挡层等薄膜沉积。

2. 光伏产业

    高效太阳能电池的钝化层和透明导电膜制备。

3. 显示面板

    OLED、QLED等显示技术的薄膜封装。

4.新能源

    固态电池电解质、燃料电池催化层的沉积。

产品列表

品名	CAS	货号
Trimethyl(methylcyclopentadienyl)platinum(IV), 99% 三甲基(甲基环戊二烯基)合铂(IV)	94442-22-5	218004
Tungsten hexacarbonyl, 99% 六羰基钨	14040-11-0	194282
Tris(3-hydroxypropyl) phosphine, 84% 三(3-羟基丙基)膦	4706-17-6	463270
Tetrakis(dimethylamido)hafnium(IV), 99% 四(二甲胺基)铪	19782-68-4	622857新
Bis(cyclopentadienyl)cobalt(II), 98% 双(环戊二烯)钴	1277-43-6	964056新
Tetrakis(dimethylamido)tin(IV), 99.9%, trace metal basis 四(二甲氨基)锡(IV)	1066-77-9	542675
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酸)铋	142617-53-6	916543
Bis(t-butylimido)bis(dimethylamino)tungsten(VI), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲氨基)二(叔丁基亚氨基)钨(VI)	406462-43-9	918995
Tris(dimethylamino)silane, 99%, 99.999% Si 三(二甲胺基)硅烷	15112-89-7	282401
Niobium(V) ethoxide , 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 五乙醇铌(V)	3236-82-6	963633
Antimony(III) chloride, 99% 氯化锑(III)	10025-91-9	496657 危化品
Bismuth(III) chloride, 99.9% 氯化铋(III)	7787-60-2	925081
Tetrakis(dimethylamino)titanium, 97% 四(二甲氨基)钛	3275-24-9	135549
Triisopropyl borate, 98% 硼酸三异丙酯	5419-55-6	160415 危化品
1,3,5,7-Tetramethylcyclotetrasiloxane, 95% 1,3,5,7-四甲基环四硅氧烷	2370-88-9	560896
Hexamethyldisilane, 98% 六甲基二硅烷	1450-14-2	590635 危化品
Bismuth(III) chloride, 99.9% 氯化铋(III)	7787-60-2	925081
Tantalum(V) ethoxide, 99% 乙醇钽(V)	6074-84-6	938530
1,3,5,7-Tetramethylcyclotetrasiloxane, 99% 1,3,5,7-四甲基环四硅氧烷	2370-88-9	984609
Hexamethyldisilane, 98%, reagent grade 六甲基二硅烷	1450-14-2	985468 危化品
Bis(pentamethylcyclopentadienyl)iron, 97% 双(五甲基环戊二烯基)铁	12126-50-0	255587
Thulium(III) acetylacetonate, 99% 乙酰丙酮铥(III)	14589-44-7	281300
Antimony(III) chloride, 99% 氯化锑(III)	10025-91-9	496657 危化品
Triruthenium dodecacarbonyl, 99% 十二羰基三钌	15243-33-1	526096
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)铒(III)	35733-23-4	933034
Bis(cyclopentadienyl)cobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(环戊二烯基)钴	1277-43-6	941710
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(2,2,6,6-四甲基-3,5-庚二酮酸)镍(II)	14481-08-4	990065
Magnesium acetylacetonate dihydrate, 98% 乙酰丙酮镁 二水合物	68488-07-3	148020
Palladium(II) hexafluoroacetylacetonate, 98% 六氟乙酰丙酮钯(II)	64916-48-9	357525
Hafnium(IV) acetylacetonate, 99% 乙酰丙酮铪(IV)	17475-67-1	585043
Bis(ethylcyclopentadienyl)ruthenium(II), 99.99%, trace metals basis 双(乙基环戊二烯基)钌(II)	32992-96-4	588417
Vanadium (V) tri-i-propoxy oxide, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(异丙氧基)氧化钒(V)	5588-84-1	946165
Tantalum(V) ethoxide, 99.99% 乙醇钽(V)	6074-84-6	142830
Tetrakis(dimethylamido)hafnium(IV), 98%, 99.99%-Hf, ＜0.15% Zr 四(乙基甲基胺基)铪(IV)	352535-01-4	412116
Tetrakis(ethylmethylamino) hafnium (IV), ICP-99.99% 四(甲乙基氨基)铪(IV)	352535-01-4	997501
Bis(cyclopentadienyl)cobalt(II), 98% 双(环戊二烯)钴	1277-43-6	964056新
Tetrakis(dimethylamido)tin(IV), 99.9%, trace metal basis 四(二甲氨基)锡(IV)	1066-77-9	542675
Niobium(V) ethoxide , 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 五乙醇铌(V)	3236-82-6	963633
Gallium(III) acetylacetonate, 99% 乙酰丙酮镓(III)	14405-43-7	153452
Tin(II) acetylacetonate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙酰丙酮酸)锡(II)	16009-86-2	111772
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三[N,N-二(三甲基硅烷基)氨基]镧(III)	35788-99-9	116668
Cycloheptatriene molybdenum tricarbonyl, 99% 环庚三烯三羰基钼	12125-77-8	121252
Tin(IV) tert-butoxide, 99.99% 叔丁氧锡(IV)	36809-75-3	204504
Tetravinyltin, 95% 四乙烯基锡	1112-56-7	227842
Tris(cyclopentadienyl)yttrium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(环戊二烯)化钇	1294-07-1	320377
Tris(isopropylcyclopentadienyl)lanthanum(III), 99.99% 三(异丙基环戊二烯)镧(III)	68959-87-5	503313
Tris(dimethylamino)gallium(III) dimer, 98% 三(二甲胺基)镓(III)二聚体	57731-40-5	626076
Tris(methylcyclopentadienyl)yttrium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(甲基环戊二烯)化钇(III)	329735-72-0	634274
Tris[N,N-bis(trimethylsilyl)amide]yttrium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三[N,N-双(三甲基硅烷)胺]钇(III)	41836-28-6	948974
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III) triglyme adduct, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钇	15632-39-0	996636
DimethylAminopropyl-Dimethyl Indium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder [3-(二甲氨基)丙基]二甲基铟	120441-92-1	999241
Triphenylantimony, 98% 三苯基锑	603-36-1	105370
Tetrakis(diethylamino)hafnium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(二乙氨基)铪(IV)	19824-55-6	113501
(t-Butylimido)tris(diethylamino)niobium(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(二乙氨基)(叔丁基亚氨基)铌(V)	210363-27-2	1177614
(t-Butylimido)tris(methylethylamino)niobium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(乙基甲氨基)(叔丁基亚氨基)铌(V)	864150-47-0	1177615
Cyclopentadienyl Tris(dimethylamino) Zirconium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (环戊二烯基)三(二甲氨基)锆	33271-88-4	1177621
Bis(pentamethylcyclopentadienyl)barium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯)钡	112379-49-4	1415112
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钌	38625-54-6	147692
Bis(N,N'-di-t-butylacetamidinato)nickel(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(N,N'-二-叔丁基乙脒基)镍(II)	940895-79-4	1751074
Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲基氨基)二(叔丁基亚氨基)钼(VI)	923956-62-1	1822342
Bis{[μ-[[di(trimethylsilyl)amide]}bis{[di(trimethylsilyl)amide]}dicobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双{[μ-[[二(三甲基甲硅烷基)酰胺]}双{[[[二三甲基甲硅烷基)酰胺]}双钴(II)	93280-44-5	1880209
Tris(dimethylamido)antimony(III), 99.9% 三(二甲基氨基)锑(III)	7289-92-1	198117
Bis(pentamethylcyclopentadienyl)magnesium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)镁	74507-64-5	229956
Tetrakis(ethylmethylamino)vanadium(IV), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(乙基甲基氨基)钒(IV)	791114-66-4	2445938
Erbium(III) 2,4-pentanedionate, 99%, hydrate 乙酰丙酮饵(III)	14553-08-3	265933
(3,3-Dimethyl-1-butyne)dicobalt hexacarbonyl, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (3,3-二甲基-1-丁炔)六羰基二钴(0)	56792-69-9	280361
(t-Butylimido)tris(diethylamino)tantalum(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(二乙氨基)(叔丁基亚氨基)钽(V)	169896-41-7	289272
(t-Butylimido)tris(ethylmethylamino)tantalum(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(乙基甲氨基)(叔丁基亚氨基)钽(V)	511292-99-2	345773
Bis(t-butylamino)silane, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(叔丁基氨基)硅烷	186598-40-3	474608
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium tetraglyme adduct, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(2,2,6,6-四甲基-3,5-庚二酮酸)锶四甘醇二甲醚加成物	150939-76-7	529991
Alane-N,N-dimethylethylamine complex , 99%, metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder N,N-二甲基乙胺醛烷络合物	124330-23-0	535459
Diethylaminolithium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二乙氨基锂(I)	816-43-3	540112
Bis(ethylcyclopentadienyl)manganese(II), 98% 二(乙基环戊二烯基)锰(II)	101923-26-6	555173
Tris(i-propylcyclopentadienyl)cerium(III), 99.9% 三(异丙基环戊二烯)铈(III)	122528-16-9	563251
Hexakis(dimethylamino)dialuminum, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(二甲胺基)铝二聚体	32093-39-3	572062
Pentakis (dimethylamino)tantalum(V), 98% 五(二甲氨基)钽(V)	19824-59-0	579965
Cerium(III) acetylacetonate trihydrate, 99% 乙酰丙酮铈三水合物	15653-01-7	582904
Tetrakis(diethylamino)titanium(IV), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(二乙氨基)钛(IV)	4419-47-0	903906
Antimony(III) ethoxide, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 乙醇锑	10433-06-4	905481
Zirconium(IV) tert-butoxide, 99%, 99.99%-Zr 叔丁醇锆(IV)	2081-12-1	911030
bis(dimethylamino-2-methyl-2-butoxo)nickel, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲氨基-2-甲基-2-丁氧基)镍(II)	942311-35-5	9181010
Tetrakis(ethylmethylamino)titanium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(乙基甲氨基)钛(IV)	175923-03-2	9186316
Bis(pentamethylcyclopentadienyl)cobalt(II), ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)钴(II)	74507-62-3	924019
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium hydrate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(2,2,6,6-四甲基-3,5-庚二酮酸)钡	17594-47-7	924172
1,4-Benzoquinone, 99% 1,4-对苯醌	106-51-4	427024 危化品
Bis(methylcyclopentadienyl)nickel, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(甲基环戊二烯基)镍(II)	1293-95-4	930278
Bis(N,N-di-isopropyl acetamidinyl) calcium dimer, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(异丙基乙脒基)钙	1959584-79-2	9393978
Zirconium, tris(N-methylmethanaminato)[(1,2,3,4,5-η)-1-propyl-2,4-cyclopentadien-1-yl], 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (正丙基环戊二烯基)三(二甲氨基)锆(IV)	2192174-63-1	9394093
50ml Standard cylinder, Suitable for the vast majority of domestic equipments 50mL标准钢瓶	/	9395115
60ml Standard cylinder, Suitable for the equipment of Picosun 60mL标准钢瓶	/	9395123
Lithium cyclopentadienide, ≥99.99% trace metal analysis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 环戊二烯基锂(I)	16733-97-4	948701
Bis(cyclopentadienyl)magnesium, 99.99% 二茂镁	1284-72-6	951035
Bis(ethylcyclopentadienyl)manganese, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙基环戊二烯基)锰(II)	101923-26-6	953383
Bis(diethylamino)silane, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二乙氨基)硅烷	27804-64-4	957403
Zirconium(IV) isopropoxide isopropanol complex, 99.9%, ICP-99.9% 异丙氧基锆异丙醇复合物	14717-56-7	960784
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)calcium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(2,2,6,6-四甲基-3,5-庚二酮酸)钙(II)	118448-18-3	988511
(Trimethyl)methylcyclopentadienylplatinum(IV), 99% (三甲基)甲基环戊二烯合铂(IV)	94442-22-5	78-1350
Tungsten carbonyl, 99% (<0.3%-Mo) 六羰基钨	14040-11-0	74-2200
Tris(3-hydroxypropyl)phosphine, min. 84% 三(3-羟基丙基)膦	4706-17-6	15-6375促
Tris(N,N'-di-i-propylformamidinato)lanthanum(III), (99.999+%-La) PURATREM La-FMD 三(N,N'-二-异丙基甲脒)镧(III)	1034537-36-4	57-1200
(Trimethyl)methylcyclopentadienylplatinum(IV), 99% (99.999%-Pt) PURATREM （三甲基）甲基环戊二烯基铂（IV），99％（99.999％-Pt）	94442-22-5	98-1350
Swagelok? Cylinder Assembly, 50ml with 1/4 VCR Male Bellows-Sealed Valve (High Temp) and Female Nut for CVD/ALD Swagelok® 气缸, 50ml, 带1/4“VCR外波纹管密封阀(高温)和母螺母,用于CVD / ALD	/	96-1071
Xenon(II) fluoride, 99.5% 二氟化氙	13709-36-9	54-1500
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM Tetrakis（二甲基氨基）鉿	19782-68-4	72-8000促
Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM, 50-1815, contained in 50 ml Swagelok? cylinder (96-1070) for CVD/ALD 四(二甲氨基)锡	1066-77-9	98-4050
Bis(cyclopentadienyl)cobalt(II), min. 98% (Cobaltocene) 环戊二烯基钴	1277-43-6	27-0475
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), min. 98% (99.9%-Bi) [Bi(TMHD)?] 三(2,2,6,6-四甲基-3,5-庚二酸)铋	142617-53-6	83-1000
Tris(ethylcyclopentadienyl)yttrium, 97% 三(乙基环戊二烯基)钇	476364-59-7	39-5055
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM 三（二甲胺基）硅烷	15112-89-7	14-8750
Tris(butylcyclopentadienyl)yttrium (99.9%-Y) (REO) 三(丁基环戊二烯)钇(III)	312739-77-8	39-4950
Niobium(V) ethoxide (99.9+%-Nb) 乙醇铌/五乙氧基铌（安瓿瓶包装）	3236-82-6	93-4104
Zirconium(IV) ethoxide, 99+% 四乙氧基锆	18267-08-8	93-4043
Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr) TEMAH PURATREM 四双(乙基甲基氨)铪(IV	352535-01-4	72-7720
Trimethylarsine, 99% 三甲基胂	593-88-4	33-3750
Vanadium (V) tri-i-propoxy oxide, 98+% VTIP 三异丙氧基氧化钒	5588-84-1	23-5000
Copper(II) hexafluoroacetylacetonate, anhydrous, elec. gr. (99.99+%-Cu) PURATREM 双(六氟乙酰丙酮)合铜(II)	14781-45-4	29-2928
Bis(μ-dimethylamino)tetrakis(dimethylamino)digallium, 98% 双(μ-二甲氨基)四(二甲氨基)镓, 98%	57731-40-5	31-2030
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)europium(III), 99% (99.9%-Eu) (REO) [Eu(TMHD)?] 三(2,2,6,6-四甲基-3,5-庚烷二酮铕	15522-71-1	93-6328
Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM 四(二甲氨基)锡	1066-77-9	50-1815
Tris(i-propylcyclopentadienyl)cerium(III) (99.9%-Ce) (REO) 三(异丙基环戊二烯)铈	122528-16-9	58-8000促
Tris(cyclopentadienyl)ytterbium (99.9%-Yb) (REO) 三(环戊二烯基),镱(III)	1295-20-1	70-0075
Pentakis(dimethylamino)tantalum(V), min 98% PDMAT 五(二甲氨基)钽(V)	19824-59-0	73-0800
Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW 双(叔丁基亚氨基)双(二甲基氨基)钨(VI)	406462-43-9	74-1225
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, 93-2240, contained in high-temp 50 ml Swagelok? cylinder (96-1071) for CVD/ALD 四(二甲氨基)钛	3275-24-9	98-4016
Bis(ethylcyclopentadienyl)magnesium, min. 98% 双(乙基环戊二烯)镁	114460-02-5	12-0510
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM 四（二甲氨基）钛（IV），99％	3275-24-9	22-2240
Tris(methylcyclopentadienyl)yttrium (99.9%-Y) (REO) 三(甲基环戊二烯)钇	329735-72-0	39-5050
Bis(tri-isopropylcyclopentadienyl)strontium 98% 双(三异丙基环戊二烯基)锶,98％	147658-82-0	38-1200
Zirconium(IV) t-butoxide (99.99%-Zr) PURATREM 叔丁醇锆	2081-12-1	40-1750促
Tetrakis(dimethylamino)zirconium(IV), 98% (99.99%-Zr) PURATREM TDMAZ 四(二甲基胺基)锆(IV)	19756-04-8	40-4115
Rhodium(III) acetylacetonate, 97+% (99.9%-Rh) 乙酰丙酮铑	14284-92-5	45-1800促
Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM 双(二乙基氨基)硅烷	27804-64-4	98-8810

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