有机化学
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Amethyst
J&K
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Accela
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纯度
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-
(97%-Co)
(99.8%-Rb)
(99.8+%-Rb)
(99.9%-Ba, Sr<.03%)
(99.9%-Cs)
(99.9%-Gd)
(99.9%-La)
(99.9%-Sr)
(99.95%-Ca)
(99.99%-Li)
(99.99%-Na)
(99.995%-Sr)
(99.997%-K)
(99.999%-Ba)
(99.999%-Ca)
(99.999%-Li)
(99%-Rb)
(99+%-Cs)
(99+%-Rb)
>99%
~3?N in H2O, 98 atom % 15N
≥25% NH3 in H2O, semiconductor grade PURANAL? (Honeywell 17814)
≥25% NH3 in H2O, semiconductor grade SLSI PURANAL? (Honeywell 17301)
≥25% NH3 in H2O, semiconductor grade VLSI PURANAL? (Honeywell 17605)
≥90%
≥98%
≥99.5% trace metals basis
≥99.9% trace metals basis
≥99.995% trace metals basis
≥99.999% trace metals basis
≥99%
0.4?M in THF
4?M in methanol
50?wt. % in H2O, 99.9% trace metals basis
50?wt. % in H2O, 99% trace metals basis (purity determined on metals basis)
50?wt. % suspension in toluene
85%
85+%
94%
95%
97%
97+%
98.5%
98%
98+%
99.0%(T)
99.5%
99.5+%
99.8% trace metals basis
99.9%
99.9% trace metals basis
99.95% trace metals basis
99.98% trace metals basis
99.99%
99.99% trace metals basis
99.995% trace metals basis
99.997% trace metals basis
99.999% trace metals basis
99%
99+%
anhydrous, powder, 99.99% trace metals basis
anhydrous, powder, 99.999% trace metals basis
extent of labeling: 20?wt. % loading (dry basis), matrix carbon, wet support
extent of labeling: 20?wt. % loading (dry basis), matrix carbon, wet support, De
hydrogen-storage grade
min. 85%
min. 95%
min. 97%
min. 98%
moistened with water, 10-20% Pd basis (based on dry substance)
N/A
nanopowder, <100?nm particle size (laser PSA), 99.8% trace metals basis
nanopowder, <100?nm particle size, 99.99% trace metals basis
NF
powder, ≤30?μm particle size, 98%
powder, 95%
ReagentPlus?, 99%
Sodium hydroxide-coated silica, 20-30?mesh
Sodium hydroxide-coated silica, 8-20?mesh
technical grade
technical grade, ~95%
technical grade, 95%
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